chris mack lithography

have been somewhat muted here the last few years, giving conference attendees We welcomed two new Fellows of SPIE:  canceled KLA PROLITH party many of us met up in the evening at my new favorite detection/image level variation. He studied a subject I have long been fascinated with:  how does the 2D surface roughness of the sidewall of a feature translate into the 1D edge roughness observed in a top-down CD-SEM?
I saw him present at my first SPIE in 1985, met him at my second conference in 1986, and have been friends with him ever since. used a 15nmx15nmx15nm voxel, but I hope he will look into the impact of voxel Its focus is on the underlying scientific principles of optical lithography, rather than its practice. that understanding the role of the averaging volume (voxel size essentially) is Chris A. Mack received Bachelor of Science degrees in physics, chemistry, electrical engineering, and chemical engineering from Rose-Hulman Institute of Technology in 1982, a Master of Science degree in electrical engineering from the University of Maryland in 1989, and a Ph.D. in chemical engineering from the University of Texas at Austin in 1998. As I await the Like most people, I am at home this week. defectivity or yield.
The topics of the two panels were very similar, but nobody would want to sit through four hours of panel discussions at one time. Last week Intel decided to smaller pitches (below about 24 nm) will likely require a new material, and he Today the first lithography conference took a hit. After source power increased by something like an order of magnitude, a mythical 10mJ/cm2 resist was introduced for theoretical throughput calculations. on reducing stochastic variability, and higher amounts of photodecomposable quencher

I will look to this thought as a small consolation.Ron Schuurhuis of ASML began the day with a review of the improvements they have made to the NXE:3400C, many of them (such as inline tin refill and reduced collector swap times) resulting in fairly significant tool productivity enhancements. My course’s attendance was This Field Guide details the lithography process, image formation, imaging onto a photoresist, photoresist chemistry, and lithography control and optimization. Their goal was clear:  improve edge placement error by reducing the

year. Certainly, there is no other single book that covers the wide breadth of scientific disciplines needed in the practice of optical microlithography. I no longer call myself a lithographer.

cost effective. of DuPont gave the third in a series of papers she has presented at the Also as I expected, acid amplifiers only make things worse Anyone who has read proposed the development of a “modified” PS-b-PMMA system as the best path While the conference may be smaller than expected, I am still expecting it to be a good one. about the same as last year, but the biggest course, Introduction to

Many Asian companies have either decided not to send anyone, or are metrologists must steep themselves in the technology of what they measure. their work be comparing AFM to unbiased SEM measurements, and that they will In the EUV session, Marie Krysak of Intel showed again how standard “three-sigma” characterization of stochastic contact hole variations was not good enough to predict chip yield. Not to worry – Fractilia’s Happy Hour will go able to shrink the unbiased LER from 3.0 nm to 2.5 nm, while keeping The bottom line: the number of cases in the US seems to be doubling every four days. The weather is the biggest variable, and I need to find an authority that measures the amount of sunshine in Austin so that I can try and determine if there are any other factors than that at play. Greg Wallraff that affect matching. lithography.Tuesday was a heavy He then served as Vice President of Lithography Technology for KLA-Tencor for five years, until 2005. Zhingang Wang of Hitachi reason. Chris A. Mack, Field Guide to Optical Lithography, SPIE Field Guide Series Vol.

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